The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1997
Filed:
Feb. 16, 1995
Hiroshi Ando, Nagoya, JP;
Teiyuu Kimura, Nagoya, JP;
Minako Sugiura, Anjo, JP;
Yoshikatsu Ichikawa, Hazu-gun, JP;
Nippondenso Co., Ltd., Kariya, JP;
Abstract
A manufacturing method for a hologram which can control the formation of a ghost hologram due to a surface reflected light caused on an interface with the atmosphere is disclosed. In the first manufacturing method for a hologram by a two-beam method or a one-beam method, on an interface between a substrate having a hologram photosensitive layer and the atmosphere is disposed a quarter-wave plate, and an incident light is converted from a circularly polarized light to a P-polarized light (or an S-polarized light) through the quarter-wave plate. On the other hand, in the second manufacturing method for a hologram, a substrate, which has a hologram photosensitive layer, is fittingly held by prisms on both sides thereof. A reference light is a P-polarized light, and an angle of the reference light to a surface reflected light on an interface of the reference light is set to be approximate to a right angle. It is appropriate that a reproduced hologram is manufactured by the one-beam method by using a hologram manufactured by the above method as a master hologram.