The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1997
Filed:
Jul. 12, 1993
Applicant:
Inventors:
Carlos A Paz De Araujo, Colorado Springs, CO (US);
Hitoshi Watanabe, Tokyo, JP;
Michael C Scott, Colorado Springs, CO (US);
Takashi Mihara, Saitama, JP;
Assignees:
Symetrix Corporation, Colorado Springs, CO (US);
Olympus Optical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; C23C / ; C30B / ;
U.S. Cl.
CPC ...
4271263 ; 4272553 ; 427314 ; 4273762 ; 4273722 ; 117 94 ; 117104 ; 117 88 ; 437225 ;
Abstract
A substrate is prebaked in an oxygen furnace. A thin film of layered superlattice oxide is formed on the substrate by a chemical vapor deposition process. The film is RTP baked to provide grains with a mixed phase of A-axis and C-axis orientation. The film may be treated by ion implantation prior to the RTP bake and oxygen furnace annealed after the RTP bake. An electrode is deposited on the layered superlattice thin film and then the film and electrode are oxygen furnace annealed.