The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1997
Filed:
Oct. 06, 1994
Seiji Kagawa, Kawaguchi, JP;
Yoichiro Kagawa, Kawaguchi, JP;
Seiji Kagawa, Kawaguchi, JP;
Abstract
A porous film manufacturing apparatus regularly forms a large number of non-through pores with a fine opening width of sub-.mu.m to several tens .mu.m at a high density in elongated films made of various materials, with almost no deterioration in the essential characteristics of the film materials. The apparatus includes a feed unit, a perforating unit including a first block having a surface on which a large number of diamond particles with acute corner portions are deposited, a second block having a surface on which a desired protruding pattern is formed, and an elastic organic polymer sheet arranged to cover at least the protruding pattern of the second block, the first and second blocks being arranged such that the particle-deposited surface of the first block and the organic polymer sheet oppose each other, and a pressurizing unit for moving the movable block toward the stationary block until the distance between projecting ends of the particles and the surface of a portion of the organic polymer sheet located on the protruding pattern becomes smaller than the thickness of the elongated film between the movable and stationary blocks, thereby pressing the acute corner portions of the particles into the elongated film in a region opposing the protruding pattern.