The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 1997

Filed:

Apr. 12, 1994
Applicant:
Inventors:

Satoru Kitta, Nagano, JP;

Masanori Furukawa, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 41 ; 451288 ;
Abstract

The object of the invention is to provide a polishing machine, which are capable of making the degree of plane higher. The polishing machine comprises: a polishing plate for polishing a work, which is pressed thereon, the polishing plate being capable of rotating; and a driving mechanism for rotating the polishing plate, characterized in that the driving mechanism is capable of rotating the polishing plate in one direction and the other direction. In the polishing machine, since the work is polished by rotating the polishing plate in the one direction, then rotating it in the other direction, slury concentrated at a specific position of the work can be scattered, so that the work can be polished uniformly and the degree of plane can be higher.


Find Patent Forward Citations

Loading…