The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 1997

Filed:

Jun. 07, 1995
Applicant:
Inventor:

George Gutman, Birmingham, MI (US);

Assignee:

Osmic, Inc., Troy, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 84 ; 378 82 ;
Abstract

This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.


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