The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 1997

Filed:

Dec. 04, 1991
Applicant:
Inventors:

Hiroshi Yanagioka, Yokohama, JP;

Yoshio Ogawa, Tokyo, JP;

Yoshiaki Komatsubara, Tokyo, JP;

Kenji Kobayashi, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
422170 ; 261 77 ; 261115 ;
Abstract

A method and apparatus for the treatment of a waste gas containing dust and chemical contaminants are disclosed. The apparatus includes a combination of a cooling/dust-eliminating chamber and a chemical treatment chamber in a single container. The first mentioned chamber is provided with sprayers for the cooling liquid, a perpendicular bulkhead or pipes, a collecting plate for the cooling liquid and gas-dispersing pipes in a special configuration, so that the dust-liquid separation can be efficiently effected without badly affecting the chemical treatment of the gas. Thus, the apparatus can be minimized in size as a whole and made economically attractive.


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