The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 1997
Filed:
Oct. 26, 1992
Yoichi Otsuka, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A satisfactory resist pattern can be formed, by focusing detection at a high accuracy, from a photoresist containing an infrared absorption dye and by an exposure method of determining focusing by an infrared light and using a photoresist containing the infrared absorption dye as the photoresist, whereby the focusing detection system is free from the effect of the secondary reflection or the like, that is, the focusing detection system is free from the effect of light transmitted or reflected in the substrate, whether the substrate is infrared light reflecting or permeating.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile