The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 1997
Filed:
Sep. 19, 1994
Applicant:
Inventors:
Audrey C Engelsberg, Milton, VT (US);
Donna R Fitzpatrick, Washington, DC (US);
Assignee:
Cauldron Limited Partnership, Bethesda, MD (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ; B08B / ; B23K / ;
U.S. Cl.
CPC ...
216 65 ; 216 66 ; 134-1 ; 21912169 ; 21912184 ; 20419232 ;
Abstract
An apparatus and method for selectively removing undesired material from the surface of a substrate provides a flow of inert gas over the undesired material substrate surface while irradiating the undesired material with energetic photons. The invention enables removal of undesired material without altering the physical properties of the material underlying or adjacent the removed, undesired material. The invention can be applied to produce changes in surface topography (including nano-structuring and surface planarization).