The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 1997
Filed:
Feb. 01, 1995
Applicant:
Inventors:
Zoran Krivokapic, Santa Clara, CA (US);
David S Bang, Palo Alto, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429811 ; 20419212 ;
Abstract
A collimator system for use in PVD sputtering of semiconductor wafers having multiple tiers provided between a target and wafer substrate. The collimator system prevents target atoms from contacting the wafer at substantially oblique angles, thereby providing good step coverage uniformity over the surface of the wafer. Additionally, the presence of more than one tier prevents localized build-up of target atoms that occurs in conventional single tier collimators, thereby providing good flat coverage uniformity over the surface of the wafer.