The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 1997
Filed:
Sep. 01, 1995
Robert J Krupa, Leominster, MA (US);
Edward E Owen, Nashua, NH (US);
Thermo Jarrell Ash Corp., Franklin, MA (US);
Abstract
A dual-axis plasma imaging system for use in spectroscopic analysis of material. The system includes a plasma torch having a tubular member with an upstream inlet end for receiving a flow of material to be analyzed and a downstream end for discharge of the material. An induction coil is provided for effecting plasma optical emission from the material, and a spectrometer for analyzing the emission. A first optical imaging device collects and focuses an axial emission component onto a primary aperture of the spectrometer. The first device is in a principal optical path between the tubular member and the spectrometer. A second optical imaging device in a secondary optical path collects and focuses a radial emission component onto the primary aperture of the spectrometer. The secondary path is angularly offset from the principal path. A folding mirror in the principal optical path, when in a stowed position, permits the first device to collect and focus the axial emission component onto the primary aperture. In an operative position, the mirror permits the second device to collect and focus the radial emission component onto the primary aperture. A system is provided for communicating the radial emission component to the folding mirror.