The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 1997

Filed:

Oct. 30, 1995
Applicant:
Inventors:

Akiko Yamaya, Hino, JP;

Yasunori Wada, Hino, JP;

Hirobumi Yamashita, Hino, JP;

Shoji Nishio, Hino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430399 ; 430398 ; 430434 ; 430455 ;
Abstract

A method for continuously processing an exposed silver halide photographic light sensitive material comprises the steps of: developing said material with a developing solution, the developing solution being replenished with a first water and a solid developing composition containing a developing agent and a first sulfite according to a processing amount of said material; and fixing the developed material with a fixing solution, the fixing solution being replenished with a second water and a solid fixing composition containing a fixing agent and a second sulfite according to a processing amount of said material, and no other processing being carried out between said developing and said fixing, wherein the second sulfite is replenished in an amount of 0 to 0.05 mol per liter of the second water.


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