The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 1997
Filed:
Jan. 26, 1996
Yutaka Watanabe, Isehara, JP;
Masami Hayashida, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A reflection type mask includes a reflective portion effective to reflect soft X-rays or vacuum ultraviolet rays, and an absorbent material pattern formed on the reflecting portion, wherein, when the wavelength of the soft X-rays or vacuum ultraviolet rays is denoted by .lambda. and the optical constant of the material constituting the absorbent material pattern is denoted by 1-.delta.-ik (where .delta. and k are real numbers while i is an imaginary number), a relation 0.29<k/.vertline..delta..vertline.<1.12 is satisfied, and wherein the thickness d of the absorbent pattern satisfies a relation 3.delta./(16.vertline..delta..vertline.)<d<5.lambda./(16.vertline..delta.. vertline.).