The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 1997

Filed:

Sep. 28, 1995
Applicant:
Inventor:

Taro Fujima, Higashi-Murayama, JP;

Assignee:

Tabata Co. Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F / ;
U.S. Cl.
CPC ...
2428 ; 2441 ; 2443 ;
Abstract

A diving face mask comprising a pair of front lenses detachably engaged in lens holding portions of an outer peripheral frame and, annular inner peripheral frames to be snapped in the lens holding portions so as to bear against front surfaces of the lenses, said annular inner peripheral frames being cut away partially in the circumferential direction thereof and therefore being discontinuous circumferentially.


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