The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 1997
Filed:
Feb. 20, 1996
Takashi Masuyuki, Kanagawa-ken, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Test reticle patterns (reticle pattern images) are transferred by exposure onto an unexposed wafer in a plurality of rows parallel to a predetermined direction, and a rotation angle of each reticle pattern image is obtained from an amount of positional displacement in the vertical direction (direction Y) (Steps 102 to 104). A rotation angle of each reticle pattern image is obtained from the bend of a moving mirror within an exposure range on a wafer stage which is obtained by correcting an amount of positional displacement in a horizontal direction (direction X) by the rotation angle obtained from the positional displacement in the vertical direction and the bend of the moving mirror assumed in a region outside the exposure range, and a residual rotation error between the thus obtained rotation angle and the actual rotation angle is obtained (Steps 105 to 107). An amount of bend of the moving mirror in the region outside the exposure range is obtained from the residual rotation error (Steps 108 and 109), thereby accurately measuring an amount of bend of the moving mirror in a region which is outside the exposure range and which is illuminated with a light beam from an interferometer for rotation error measurement.