The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 1997
Filed:
Aug. 04, 1995
Teruo Takanashi, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In a photographic printer including a print-exposing device having a light source and a light controlling filter, an image recorded onto a film is printed on a photosensitive material by irradiating, onto the photosensitive material, light emitted from the light source and transmitted through the light controlling filter and the film. The light transmitted through the light controlling filter and the film is incident upon a photometric device, and the photometric device photometrically measures the image recorded on the film. The quantity of light incident upon the photometric device is controlled by a control device so as to reduce the quantity of light to a quantity of light which is lower than a quantity of light when printing exposure is carried out, in a case in which printing exposure by said print-exposing device is suspended for a time longer than a predetermined time. In a state in which printing exposure is not performed for a time longer than the predetermined time, the quantity of light incident upon the photometric device is reduced to a level lower than that of the quantity of light during printing exposure. Therefore, deterioration of the photometric device due to sticking and the like is mitigated, and the life thereof can be extended. Further, labor for maintenance such as replacement and inspection of the photometric device is reduced.