The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 1997
Filed:
Oct. 12, 1995
Applicant:
Inventor:
Katsumi Uchikawa, Kawasaki, JP;
Assignee:
Fujitsu, Ltd., Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-9 ; 430311 ; 430319 ; 430327 ; 428901 ; 427 96 ;
Abstract
A method for forming a resist pattern comprising the steps of: placing a transparent mask substrate on an object coated with a resist; drawing a mask pattern directly on the transparent mask substrate with an ink jetter; exposing the resist to light with intervention of the mask pattern; peeling off the mask substrate; and developing the resist, thereby forming a predetermined resist pattern.
Uchikawa, Katsumi. (1997). Method and apparatus for forming resist pattern, and printed wiring (U.S. Patent No. 5637426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5637426
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile