The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 1997

Filed:

Mar. 16, 1994
Applicant:
Inventors:

Jan Haisma, Eindhoven, NL;

Cornelis L Adema, Eindhoven, NL;

Lambertus Postma, Eindhoven, NL;

Mathijs P Souts, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 36 ; 451 28 ;
Abstract

Method of polishing a surface (5a) of a noble metal or an alloy comprising mainly noble metal, in which a polishing means is moved across the surface while exerting a polishing pressure for obtaining a plane and smooth polished surface without any defects. A composition comprising demineralized water with 20 to 40% by weight of an organic liquid comprising a poly-alcohol or a derivative thereof, for example, glycerol, and particles which can be encapsulated and have a Knoop's hardness of between 5 and 50 GPa, for example Al.sub.2 O.sub.3 grains, is used as a polishing means.


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