The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 1997

Filed:

Apr. 27, 1995
Applicant:
Inventors:

Andrei Csipkes, Lawrenceville, GA (US);

John M Palmquist, Lilburn, GA (US);

Assignee:

Lucent Technologies Inc., Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356345 ; 356359 ; 385 85 ;
Abstract

A zone analysis system and method (211) optimize speed and minimize adverse effects resulting from noise in an inspection system (90) for measuring disparity between two surfaces. In particular, the zone analysis system and method (211) can be implemented in an inspection system (90) for contactlessly measuring undercut or protrusion of an optical fiber (26) relative to a surrounding support material (36) at the endface (79) of an optical fiber termination (37). In structure, the inspection system (90) has a measurement apparatus (91) with an interferometer (98) controlled by a machine vision system (92) for determining the degree of disparity. The inspection system (90) measures an offset of an interferometric fringe (113') produced by the interferometer (98) over the target (82) in the image in order to determine the disparity. Further, the machine vision system (92) employs the zone analysis system and method (211) for optimizing the performance thereof.


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