The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 1997
Filed:
Dec. 28, 1994
John S Petersen, Austin, TX (US);
Kim R Dean, Austin, TX (US);
Daniel A Miller, Round Rock, TX (US);
Shipley Company, L.L.C., Marlboro, MA (US);
Sematech, Inc., Austin, TX (US);
Abstract
Reduction of reflection from an integrated circuit substrate during exposure of a photoresist layer on a surface such as an integrated circuit wafer is minimized by incorporating an antireflective coating between the photoresist layer and the integrated circuit substrate. The antireflective layer, after exposure and development of the photoresist layer, is preferably removed by exposing the non-masked antireflective layer to activating radiation while heating the coating to induce a solubilizing reaction in an antireflective coating and a curing reaction in an overlying photoresist mask. Thereafter, the exposed portions of the antireflective layer are removed by treatment with a suitable developer.