The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 1997
Filed:
Nov. 16, 1995
Nobuo Matsumoto, Kanagawa, JP;
Hisatsugu Torii, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A photosensitive material processing apparatus prevents a developing solution from adhering to a photosensitive material before it is fed into a developing tank, so as not to cause developer streaks. A holding member which supports inlet guide rollers and a holding member which supports outlet guide rollers can independently be taken out of a transport rack for cleaning. The developing solution dripped from the outlet guide rollers does not adhere to the inlet guide rollers. Accordingly, unevenness in development can be prevented, which would occur when the developing solution adheres to the transported photosensitive material before it enters the processing solution.