The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 1997

Filed:

Dec. 20, 1995
Applicant:
Inventors:

Jeffrey B Hill, Stillwater, MN (US);

Andrew J Ouderkirk, Woodbury, MN (US);

Daniel P Stubbs, May Township, Washington County, MN (US);

Robert S Jackson, Little Canada, MN (US);

Douglas S Dunn, Maplewood, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
430347 ; 430-5 ; 430945 ; 21912168 ; 2505 / ;
Abstract

A system for prolonging the useful life of a mask while ablating a pattern into a workpiece. The system includes a workpiece, a debris-blocking layer thereon, a laser directed toward the workpiece, and a mask provided between the laser and debris-blocking layer. The workpiece may be a data storage disk comprising a substrate and a magnetic coating thereon. The laser may be an ultraviolet laser and the debris-blocking layer should be transparent to the light emitted by the laser. The pattern may include concentric or spiral optical servo tracks in the magnetic coating. The debris-blocking layer minimizes degradation of the mask, thereby minimizing the need to clean the mask and prolonging the useful life of the mask.


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