The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 1997

Filed:

Apr. 14, 1995
Applicant:
Inventors:

Bernhard Luy, Sulzburg, DE;

Ulf Konig, Karlsruhe, DE;

Matthias Tondar, Hausen i. W., DE;

Assignee:

Glatt GmbH, Binzen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B / ;
U.S. Cl.
CPC ...
34582 ; 34585 ; 34372 ;
Abstract

An apparatus for the production and/or treatment of particles has a gas circulation possessing a process chamber and a gas circulation device and at least one spray nozzle. The latter has a nozzle body with a liquid outlet and a gas passage surrounding the nozzle body at the liquid outlet and entering the process chamber. For the production and/or treatment of particles, the pressure in the gas circulation is reduced to a value below the ambient air pressure by a suction device and gas is circulated by the gas circulation device so that gas flows upward through the process chamber. In addition, a liquid is sprayed in the process chamber from time to time through the spray nozzle and at the same time gas is passed from a branch of the gas circulation to the gas passage of the spray nozzle and through the latter into the process chamber. This gas protects the spray nozzle from the adhesion of sprayed liquid without additional gas entering the gas circulation from outside.


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