The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 1997

Filed:

Apr. 20, 1995
Applicant:
Inventors:

Miwa Ooka, Tokyo, JP;

Tetsuzo Kuragano, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
36447424 ; 36447429 ;
Abstract

A method and an apparatus for generating sculptured surfaces which enables a sculptured surface of a specified radius to be generated easily between two free curves. A plurality of base points are set on a first free curve, and a plurality of planes are generated at each of the base points using, as the normal, a tangent of the first free line, the planes including that base point. A plurality of intersections of the second free curve and the plurality of planes are determined. A plurality of circular arcs of a specified radius are generated on each of the plurality of planes using the base point and the intersection as endpoints. A sculptured surface is then generated based on the first free curve, the second free curve, and the plurality of circular arcs.


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