The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 1997
Filed:
Dec. 28, 1994
Edward V Sullivan, Huntington Station, NY (US);
Don DiMarzio, Northport, NY (US);
Grumman Aerospace Corporation, Los Angeles, CA (US);
Abstract
Apparatus for exposing a selected area of a film, and comprising a holding assembly for holding a film, and a first support assembly connected to and supporting the holding assembly. The apparatus further comprises an exposure area control assembly located adjacent the holding assembly and forming an adjustable opening to expose a selected area of the film, and a second support assembly connected to and supporting the exposure area control assembly. Preferably, the first support assembly supports the film assembly for movement upward and downward and forward and rearward, and for pivotal movement about horizontal and vertical axes. Also, the second support assembly supports the exposure area control assembly for forward and rearward movement, and for pivotal movement about horizontal and vertical axes. In addition, in a preferred embodiment, the exposure area control assembly includes a frame and a multitude of slats supported by the frame, and these slats may be moved to vary the size, shape, and position of the adjustable opening formed by that control assembly. A preferred embodiment of the invention described herein in detail is very well suited for seamless topographic imaging large single crystal wafers, and in particular, for controlling the area of an x-ray film that is exposed when x-rays are scanned across a single crystal wafer to produce an x-ray topograph of the wafer.