The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 1997
Filed:
Aug. 08, 1996
Michael Ridgway, Aldbury, GB;
John R Fyson, Hackney, GB;
Eastman Kodak Company, Rochester, NY (US);
Abstract
It is important to control the temperature during the development stage of a photographic process in order to maximize the efficiency thereof. This is a particular problem when photographic materials are processed in high throughput processors which operate with reduced volume chemistry as these material have a tendency to cool the developer solution if not at the correct temperature. Described herein is a method for improving the temperature stability of the material to be processed by heating it before processing. The material is passed through a conditioning chamber where it is heated to the desired processing temperature prior to entering the development stage of a processor.