The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 1997
Filed:
Jul. 05, 1995
Applicant:
Inventors:
Satomi Shioiri, Tokyo, JP;
Hiroyoshi Tanabe, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430 22 ; 430394 ;
Abstract
In order to produce a photo-mask for a modified illumination, corrective patterns are added to and/or deleted from each target area of a design pattern so as to minimize a deformation of an optical image on a photo-resist layer, and the corective patterns are calcualted by using algebraic equations without a trial-and-error.