The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 1997

Filed:

Dec. 30, 1994
Applicant:
Inventors:

Lynn Galarneau, Golden Valley, MN (US);

Daniel J Rogers, White Bear Lake, MN (US);

Assignee:

Honeywell Inc., Minneapolis, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
1563798 ; 1563796 ; 4251744 ;
Abstract

An apparatus for replicating diffractive optical elements by embossing a master optical element into a photopolymer material disposed on a substrate, including a fixture for retaining, aligning, and conveying radiation to the embossing sample so that the photopolymer cures under pressure. Intermediate nickel optical elements may be used in lieu of quartz optical masters. The liquid processing techniques disclosed herein allow the replication of diffractive optics on curved substrates. This additional advantage eliminates the need for a plano optical interface further reducing the element count for a given optical system.


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