The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 1997
Filed:
Apr. 01, 1996
Daniel Graiver, Midland, MI (US);
Arnold W Lomas, Rhodes, MI (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
An interfacial polymerization process wherein organosilicon reactants are dissolved in mutually immiscible, nonaqueous solvents, and a condensation product is formed at the interface. This technique has many of the advantages of analogous organic interfacial polymerization, and may be used, for example, to prepare crosslinked films, fibers, particles, or encapsulants. Structures which cannot be prepared by other routes can be made. In particular, a well-defined alternating dimethyl/diphenyl siloxane block copolymer can be prepared by condensing a dihalo organosilicon compound such as diphenyldichlorosilane (C.sub.6 H.sub.5).sub.2 SiCl.sub.2 in diphenyl ether with a dimethyl silanolate in cyclohexane. The advantages are ability to control polymer structure, and there is no rearrangement during polymerization.