The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 1997
Filed:
Apr. 04, 1996
Naresh Chand, Berkeley Heights, NJ (US);
Sung-Nee G Chu, Murray Hill, NJ (US);
Alexei V Syrbu, Chisinau, MD;
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
The disclosed novel method of making III/V semiconductor lasers involves cleaving of the wafer along predetermined cleavage planes. A cleavage plane is defined by means of aligned non-continuous depressions. The depressions are spaced from the laser contact regions, and typically are V-grooves produced by photolithography and anisotropic etching. A further surface feature, typically a precisely positioned scribe mark, facilitates cleavage initiation. When carried out in vacuum the novel method can provide high quality, accurately positioned cleavage surfaces, and consequently can facilitate increased yield of high power lasers.