The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 1997
Filed:
Oct. 06, 1995
Katsuyuki Oikawa, Nakakubiki-gun, JP;
Toshinobu Ishihara, Nakakubiki-gun, JP;
Fujio Yagihashi, Kawasaki, JP;
Akinobu Tanaka, Fujisawa, JP;
Yoshio Kawai, Isehara, JP;
Jiro Nakamura, Isehara, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Abstract
In a chemically amplified positive resist composition comprising an organic solvent, an alkali soluble resin, an acid generator, and an optional dissolution inhibitor, a salt of a pyridine which may have an alkyl, alkoxy, amino or dialkylamino group with an alkylsulfonic acid, arylsulfonic acid or halogen atom is blended. Because of high sensitivity to deep UV and resolution and elimination of the PED problem causing T-top pattern configuration and the skirting phenomenon, the resist composition is improved in dimensional precision and lends itself to fine patterning.