The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 1997

Filed:

Jun. 20, 1995
Applicant:
Inventors:

Gordon G Shofner, Louisville, KY (US);

William N Perry, Sonora, CA (US);

Assignees:

Durand-Raute Industries Ltd., British Columbia, CA;

Thermex-Thermatron, Inc., Bay Shore, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
1562744 ; 1563804 ; 1563806 ;
Abstract

A continuous layup LVL press having upper and lower parallel, opposed platens separated by a variable distance. An RF energy source is coupled between the platens. RF deflectors are provided on each opposed end of each platen, with the deflectors projecting outwardly away from respective inner edges of the platens. The deflectors may be triangular in a cross-sectional plane of the press; or, they may be arcuate in cross-section. Additional RF deflectors may be provided on each opposed longitudinal edge of each platen, with the additional deflectors projecting outwardly away from respective inner longitudinal edges of the platens.


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