The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 1997

Filed:

Apr. 28, 1995
Applicant:
Inventor:

Alan E Lewis, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; G05B / ;
U.S. Cl.
CPC ...
359717 ; 364148 ; 364156 ;
Abstract

Manufacturing of a desensitized lens system including: i) providing a starting point lens design having a plurality of aspheric surfaces; ii) decentering the design parameters of one of the aspheric surfaces; iii) optimizing the lens design with a decentered aspheric surface parameter by utilizing both positive and negative field rays to come up with optimum parameters for aspheric surfaces; iv) dropping the decenter out when the optimization is complete to obtain the nominal lens system parameters.


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