The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 1997

Filed:

Apr. 15, 1994
Applicant:
Inventors:

Daniel Y Pai, Millbury, MA (US);

Stephen S Rodriguez, Monument Beach, MA (US);

Kevin J Cheetham, Millbury, MA (US);

Gary S Calabrese, North Andover, MA (US);

Roger F Sinta, Woburn, MA (US);

Assignee:

Shipley Company, L.L.C., Marlborough, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
4302701 ; 4302801 ; 4302811 ; 4302831 ; 522 65 ;
Abstract

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.


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