The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 1997
Filed:
Apr. 18, 1995
Applicant:
Inventors:
Assignees:
Wako Pure Chemical Industries, Ltd., Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430192 ; 430170 ; 4302701 ; 430326 ; 430330 ; 430920 ; 430923 ; 430924 ; 522 33 ; 522 36 ; 522 59 ;
Abstract
A photoresist composition comprising (a) a difficultly alkali-soluble special resin, (b) a photo-sensitive compound capable of generating a carboxylic acid, and (c) a solvent, is effective for pattern formation using deep ultraviolet light, KrF excimer laser beams, etc.
Urano, Fumiyoshi. (1997). Resist material (U.S. Patent No. 5627006). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5627006
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile