The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 1997
Filed:
Jun. 06, 1995
Applicant:
Inventors:
Satoshi Watanabe, Niigata-ken, JP;
Katsuyuki Oikawa, Niigata-ken, JP;
Toshinobu Ishihara, Niigata-ken, JP;
Akinobu Tanaka, Tokyo, JP;
Tadahito Matsuda, Tokyo, JP;
Yoshio Kawai, Tokyo, JP;
Assignees:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
4302701 ; 430914 ; 430921 ; 522 15 ; 522 31 ;
Abstract
A chemically amplified, positive resist composition contains a trifluoromethanesulfonic or p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salt and a nitrogenous compound. The composition is highly sensitive to high energy radiation, especially KrF excimer laser and has high sensitivity, resolution and plasma etching resistance while the resulting resist pattern is heat resistant.