The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 1997
Filed:
May. 27, 1994
Keisuke Naruse, Hiratsuka, JP;
Yukari Takeda, Hiratsuka, JP;
Naozumi Iwasawa, Hiratsuka, JP;
Hideo Kogure, Atsugi, JP;
Kansai Paint Co., Ltd., Hyogo-ken, JP;
Abstract
A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising: (A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s), (B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and (C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water. This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.