The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 1997
Filed:
Jun. 15, 1994
Willis H Smith, Jr, Newbury Park, CA (US);
Hugh L Garvin, Malibu, CA (US);
Klaus Robinson, Woodland Hills, CA (US);
Leroy J Miller, Canoga Park, CA (US);
JVC - Victor Company of Japan, Ltd., Yokohama, JP;
Abstract
A substrate (20) is treated prior to use to induce a near-perpendicular orientation of a liquid crystal director (26) relative to the substrate. A layer of silica (98) is deposited upon the substrate (20) by in-line magnetron sputtering as the substrate ( 20) is moved past the sputtering target (78), and the silica-coated substrate (20) is thereafter treated with a long-chain alcohol. The alcohol-treated substrate (20) is covered with a layer of liquid crystal (22), the director (26) of the liquid crystal (22) assuming a field-off state tilted about 1-3 degrees from the perpendicular toward an azimuthal direction (30) parallel to the direction of movement of the substrate (20) during deposition.