The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 1997
Filed:
Mar. 26, 1996
Japan Hydrazine Co., Ltd., Tokyo, JP;
Abstract
A method of producing a choline having a high purity without containing by-products by using a molecule-inclusion complex of the choline as a starting material. A choline inclusion complex without containing by-products is obtained by reacting an aqueous solution of the choline containing, as by-products, those cholines to which are added ethylene oxides with host molecules such as of 1,1'-bis-.beta.-naphthol, and is further reacted with a carbon dioxide gas in order to obtain an aqueous solution of a choline carbonate and/or a choline bicarbonate of a high purity, which is then subjected to the electrolysis using a cation-exchange membrane as a diaphragm, in order to obtain an aqueous solution of the choline of a high purity without containing by-products. The choline that is obtained is a strongly basic compound having a high purity and is very useful as a photoresist-developing solution.