The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 1997

Filed:

Oct. 31, 1995
Applicant:
Inventor:

Takeshi Sampei, Hino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430398 ; 430434 ; 430435 ; 430440 ; 430446 ; 430447 ; 430264 ; 430598 ; 430599 ; 430600 ; 430603 ; 430619 ; 430613 ; 430523 ; 430531 ; 430536 ;
Abstract

A method for processing a silver halide photographic light-sensitive material by an automatic processor is disclosed. The processing method comprises the steps of (1) developing a silver halide photographic light-sensitive material with a developer being in a developing tank of said automatic processor while replenishing a developer replenisher in a rate of from 50 ml to 330 ml per square meter of the light-sensitive material processed and (2) fixing said developed silver halide photographic light-sensitive material with a fixer being in a fixing tank of said automatic processor while replenishing a fixer replenisher in a rate of from 50 ml to 330 ml per square meter of the light-sensitive material. The light-sensitive material comprises a support and at least one silver halide emulsion layer provided on a surface of a support which is a stretched film composed of a styrene copolymer having a syndiotactic structure or a composition containing said styrene copolymer.


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