The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1997
Filed:
Oct. 13, 1995
Applicant:
Inventors:
Makoto Katayama, Hyogo, JP;
Tomohiko Kanie, Hyogo, JP;
Assignee:
Sumitomo Electric Industries, Ltd., Osaka, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 64 ; 385123 ;
Abstract
A method of increasing index of refraction of silica glass includes the step of irradiating a prescribed region of silica glass with X-ray having a wavelength within a range of from 1.2 .ANG. to 7.0 .ANG., and exciting K shell electrons of silicon atoms in the irradiated region with the X-ray, so that the index of refraction in the irradiated region is increased efficiently.