The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1997
Filed:
Aug. 09, 1995
Kimitoshi Saito, Saitama-ken, JP;
Takashi Yamamoto, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A photometric system structure used in a printer section in which an image of a photographic film is printed onto a photosensitive material through a lens system. The lens system can be removed from an optical axis of light emitted from a light source and replaced by another lens system. A photometric device is disposed on the optical axis of the light emitted from the light source and changes an optical axis direction of at least a part of the light emitted from the light source to measure the light whose optical axis direction has been changed and which is used as photometric light. A beam splitter moves integrally with each of the lens systems. An optical-path correction lens is disposed on the optical axis of photometric light whose optical axis direction has been changed, and is provided such that a positional relationship between the beam splitter and the optical-path correction lens is fixed, so as to correct and adjust, to a predetermined length, an optical-path length between the light source and a position where the photometric light is measured.