The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1997
Filed:
Jun. 03, 1996
William Walters, Elkton, MD (US);
Richard Summers, Conowingo, MD (US);
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Abstract
An apparatus is provided for selectively altering the jet pattern produced y a shaped charge round upon detonation by selectively providing confinement mass(es) on the surface of an outer casing of the round. Confinement mass(es) may be provided to induce a tamping effect upon detonation of the round. The placement of the confinement mass(es) relative to one another and to the round may produce different resulting jet patterns upon detonation. The mass(es) may be movable or removable such that the round may be configured to produce different jet patterns in the field or prior to targeting. Coherent or diffused jet patterns may be utilized, for example to penetrate armor of differing thicknesses or to alter the damage area created by the round.