The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1997
Filed:
Nov. 16, 1995
Applicant:
Inventors:
Assignee:
Samsung Electronics Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D / ;
U.S. Cl.
CPC ...
432241 ; 432152 ;
Abstract
A vertical diffusion furnace comprising; a quartz tube, a plurality of wafers loaded into the quartz tube, and a gas inlet formed in the quartz tube proximate a lowermost wafer in the plurality of wafers, and providing reactive gases into the quartz tube.
Choi, Sang-kook. (1997). Vertical diffusion furnace having improved gas flow (U.S. Patent No. 5616025). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5616025
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile