The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 1997
Filed:
May. 16, 1996
Applicant:
Inventor:
Shinji Ohara, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
257797 ; 257758 ; 257765 ; 257740 ; 257774 ;
Abstract
An alignment accuracy check pattern includes a contact hole formed in an insulating film on a major surface of a semiconductor substrate in a region different from an element region, and a photoresist for patterning which is formed in at least part of the contact hole. A wiring layer is formed under the insulating film, and another insulating film is formed under the wiring layer.