The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 1997

Filed:

Jan. 02, 1996
Applicant:
Inventors:

Thomas Gessner, Chemnitz, DE;

Martin Hafen, Rottweil, DE;

Eberhard Handrich, Kirchzarten, DE;

Peter Leinfelder, Ehrenkirchen, DE;

Bruno Ryrko, Denzlingen, DE;

Egbert Vetter, Gelenau, DE;

Maik Wiemer, Limbach-Oberfrohna, DE;

Assignee:

LITEF GmbH, Freiburg im Breisgau, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257254 ; 257417 ; 257418 ; 257420 ; 7351422 ; 7351423 ; 7351432 ; 7351436 ; 73DI / ;
Abstract

A high precision micromechanical accelerometer comprises a layered structure of five (5) semiconductor wafers insulated from one another by thin oxide layers. The accelerometer is formed by first connecting a coverplate and a baseplate to associated insulating plates. Counter-electrodes, produced by anisotropic etching from the respective insulating plates, are fixed to the coverplate and the baseplate respectively. The counter-electrodes are contactable through the cover or baseplate via contact windows. A central wafer contains a unilaterally linked mass (pendulum) that is also produced by anisotropic etching and which serves as a movable central electrode of a differential capacitor. The layered structure is hermetically sealed by semiconductor fusion bonding. A stepped gradation from the top is formed at a wafer edge region for attaching contact pads to individual wafers to permit electrical contacting of individual wafers. The invention permits fabrication of a .mu.B device characterized by extremely small leakage capacitances and high temperature stability.


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