The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 1997
Filed:
Jul. 26, 1995
Richard W Nosker, Princeton, NJ (US);
Joey J Michalchuk, Lambertville, NJ (US);
Paul Kuczer, Fallsington, PA (US);
Elmer W Hodge, Lancaster, PA (US);
Other;
Abstract
The present invention provides a method of making a tensioned focus mask. Such a mask includes a set of parallel strands and a set of parallel wires that are perpendicular to the strands and separated from the strands by insulator means. The method includes attaching the strands to a mask frame and then coating the strands with a first insulator. The first insulator is then cured, and a second insulator is applied to the first insulator. Next, wires are wound over and in contact with the second insulator, by rotating the mask frame and by drawing a continuous wire from a source through a tensioner, while guiding the continuous wire into desired positions overlying the strands. Finally, the second insulator is heated until the wires attach to the second insulator.