The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 1997

Filed:

May. 04, 1995
Applicant:
Inventors:

Volker Krone, Hofheim am Taunus, DE;

Michael Magerstadt, Egelsbach, DE;

Axel Walch, Frankfurt am Main, DE;

Gunter Ditzinger, Frankfurt am Main, DE;

Norbert Lill, Kronberg/Ts., DE;

Assignee:

Hoechst Aktiengesellschaft, Frankfurt am Main, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B / ;
U.S. Cl.
CPC ...
12866202 ; 528272 ; 528288 ; 528289 ; 528290 ; 528291 ; 528294 ; 528295 ; 528298 ; 528302 ; 528306 ; 528308 ; 5283086 ; 1286531 ; 12866001 ; 12866002 ; 12866007 ;
Abstract

Polycondensates which contain tartaric acid derivatives, processes for their preparation and use thereof. The invention relates to polycondensates which consist of at least 95 mol % of recurring structural units of the formula I ##STR1## where R.sup.1 is a 2,3-O-alkylidenetartaric acid derivative (II) or furo[2,5] (V), alkyl, alkenyl, cycloalkyl, cycloalkenyl, aryl or a heterocycle, X is --O-- --NH-- or --S-- and R.sup.2 is 2,3-O-alkylidene-L-threitol (III) or a compound of the formula VI, alkyl, alkenyl, cycloalkyl, cycloalkenyl, aryl or a heterocycle, with the proviso that more than 5 mol % of the radicals R.sup.1 and/or R.sup.2 are present in the polycondensate of the formula I, where R.sup.1 is compound of the formula II or R.sup.2 is a compound of the formula III or R.sup.1 is a compound of the formula II and R.sup.2 is a compound of the formula III, or in which more than 5 mol % of the radicals R.sup.1 and R.sup.2 are present in the polycondensate of the formula I, where


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