The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 1997

Filed:

Jan. 26, 1996
Applicant:
Inventors:

David H Levy, Rochester, NY (US);

Lyn M Eshelman, Penfield, NY (US);

Paul D Zimmerman, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430567 ; 430570 ; 430581 ;
Abstract

A radiation-sensitive high bromide {111} tabular grain emulsion is disclosed in which at least 90 percent of silver halide epitaxy of an isomorphic face centered cubic crystal lattice structure containing at least 1 mole percent iodide is deposited on the {111} major faces in the form of monocrystalline terraces. Each epitaxial terrace is grown from a nucleation site along an edge of a {111} major face inwardly, with terraces overlying less than 25 percent of the {111} major faces. Surprisingly, these emulsions exhibit higher photographic speeds than those produced by growing silver halide epitaxy outwardly as protrusions from the corners or edges of the tabular grains.


Find Patent Forward Citations

Loading…