The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 1997
Filed:
Aug. 15, 1995
Kwang-Ryeol Lee, Seoul, KR;
Kwang-Yong Eun, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
An apparatus and method for simultaneously coating a large number of cylindrical substrates employs plural pairs of power electrode and the ground electrodes connected with an independent power sources in order to promote the uniform coating of the substrates. The apparatus uses a high-frequency plasma chemical deposition method and comprises a power supply system, a gas supply system, and a vacuum system. These systems are operatively connected to a reactor. The reactor comprises plural electrodes, workpiece supports, insulators, annular ground electrodes, gas outlets and gas supply means. The method comprises a step for stacking the substrates or the workpiece supports and combining them with the electrodes, a step for introducing gas to the reactor, a step for applying power to the power electrodes, and a step or maintaining the pressure in the reactor constant.