The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 1997
Filed:
Aug. 09, 1994
Other;
Abstract
A photolithography method copies a pattern plane onto a working plane by a rotating imaging system. The pattern plane is parallel to the working plane. At a given instance, the imaging system images a small region of the pattern plane to the working plane. The imaging system rotates around a fixed axis perpendicular to the pattern plane and on each pass copies a circular arc shaped region from the pattern plane to the working plane. Synchronized translation of the pattern plane and working plane in conjunction with rotation of the imaging system allows the entire pattern plane to be copied to the working plane. The photolithography method can achieve high resolution over a large field-of-view with high write speed and can include an autofocus system to account for variation in the flatness of the working plane. This photolithography method can be used in the visible, UV, IR or x-ray wavebands.